Merck Patent Gmbh

Az Electronic Materials (Luxembourg) S.a.r.l.

Clariant International Ltd

Az Electronic Materials USA Corp.

Aventis Research & Technologies Gmbh & Co Kg

Kabushiki Kaisha Toshiba

Ricoh Company, Ltd.

Hoechst Aktiengesellschaft

Clariant Corporation

Hoechst Research & Technology Deutschland Gmbh & Co. Kg

Aventis Research & Technologies

Ridgefield Acquisition

Hoescht Research & Technology Deutchland Gmbh & Co.

Toshiaki Nonaka

Daishi Yokoyama

Rainer Wingen

Naofumi Yoshida

Takashi Fuke

Katsuto Taniguchi

Yuji Tashiro

Barbara Hornung

Megumi Takahashi

Yasuaki Tanaka

Hans-Rolf D&uuml;bal

Wolfgang Schmidt

Takashi Sekito

Atsuko Noya

Masayoshi Suzuki

Yuki Hirayama

Tadashi Kishimoto

Ayako Takeichi

Javier Manero

Ayako Ogawa

Ji Li

Hans-Rolf Dübal

Tohru Okabe

Hirohiko Nishiki

Yohei Takano

Yasuyuki Takiguchi

Toshiaki Tokita

Koh Fujimura

Hiroyuki Sugimoto

Yumi Matsuki

Yoshio Murakami

Shogo Murashige

Izumi Ishida

Kazuya Nagao

Masanobu Hayashi

Stephan Dertinger

Motoki Misumi

Hidemasa Yamaguchi

Yukiharu Uraoka

Seishi Shibayama

Yasuaki Ishikawa

Masahiko Nakahara

Li Ji

Haruki Amagawa

Haruki Amakawa

Hirokazu Ikeda

Yoshisuke Toyama

Takahide Suzuki

Daishi Tokoyama

Kei Li

Yuki Tashiro

To provide a photosensitive siloxane composition capable of forming a pattern having a desired taper angle and a desired linewidth. [Means] The present invention provides a photosensitive siloxane composition comprising: a polysiloxane having a structure represented by the following formula (ia′): (L is an alkylene or phenylene), a photoactive agent, and a solvent.

Photosensitive siloxane composition and pattern forming method using the same

[Problem] To provide a polysiloxanecapable of forming a cured film of a thick film with high heat resistance, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition. [Means for Solution] To provide a polysiloxane comprising a repeating unit represented by the following formula (Ib), wherein Ris each independently hydrogen, alkyl, aryl, alkenyl, and the like, a composition comprising the polysiloxane, and a method of manufacturing a cured film using the composition.

Polysiloxane, composition comprising the same and cured film using the same

A method of manufacturing a fine pattern using the following steps of:

Method of manufacturing fine pattern and method of manufacturing display device using the same

To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.

Photosensitive siloxane composition and cured film formed by using the same

The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.

Photosensitive composition and color converting film

[Problem] To provide a composition for a black matrix which is a material suitable for manufacturing a black matrix, which is suitable for a high luminance display device structure and has high heat resistance and high light-shielding properties. [Means for Solution] The present invention uses a composition for a black matrix comprising: (I) a black colorant containing carbon black having a volume average particle diameter of 1 to 300 nm; (II) a siloxane polymer to be obtained by hydrolyzing and condensing a silane compound represented by a prescribed formula in the presence of an acidic or basic catalyst; (III) surface modified silica fine particles; (IV) a thermal base generator; and (V) a solvent.

Black matrix composition, black matrix, and black matrix production method

The present invention relates to providing a thin film transistor substrate containing a protective film, which can impart high driving stability. The thin film transistor substrate contains a thin film transistor and a protective film containing a cured product of a siloxane composition which covers the thin film transistor, wherein the thin film transistor has a semiconductor layer made of an oxide semiconductor, and wherein the siloxane composition contains polysiloxane, a fluorine-containing compound, and a solvent.

Thin film transistor substrate provided with protective film and method for producing same

[Problem] To provide a material, which is a composition for a black matrix, and which is suitable for a display device structure having high luminance and suitable for producing a black matrix having high heat resistance and high light shielding properties. [Means for Solution] To use a composition for a black matrix comprising (I) a siloxane polymer having specific repeating unit(s), (II) a silanol condensation catalyst, (III) a black colorant, and (IV) a solvent.

Composition for black matrix and method for producing black matrix using the same

The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.

An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.

Composite of silicon oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof

To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.

Positive type photosensitive siloxane composition

To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.

Negative-working photosensitive siloxane composition

A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 &#x212b;/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.

Positive-type photosensitive siloxane composition

[Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed. [Means for Solution] Provided are: a method of producing a composite of metal oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal, or a silane monomer with metal oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in an aqueous solvent in the presence of a phase transfer catalyst; and a composite produced by the method.

Composite of metal oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof

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Kakegawa, Japan

Toshiaki Nonaka