The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jun. 04, 2018
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Naofumi Yoshida, Yokohama, JP;
Megumi Takahashi, Kakegawa, JP;
Katsuto Taniguchi, Kakegawa, JP;
Toshiaki Nonaka, Tokyo, JP;
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/36 (2006.01); G03F 7/075 (2006.01); C08G 77/18 (2006.01); C08K 7/26 (2006.01); C08K 9/06 (2006.01); C09D 183/04 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C08G 77/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/18 (2013.01); C08K 3/36 (2013.01); C08K 7/26 (2013.01); C08K 9/06 (2013.01); C09D 183/04 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C08G 77/80 (2013.01); C08K 2201/005 (2013.01); C08K 2201/011 (2013.01);
Abstract
To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.