The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2023

Filed:

Feb. 20, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

M. Dalil Rahman, Monmouth Junction, NJ (US);

Takashi Sekito, Shizuoka, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C08G 8/02 (2006.01); C08G 8/30 (2006.01); C09D 161/16 (2006.01); G03F 7/11 (2006.01); C08G 61/02 (2006.01); B05D 1/00 (2006.01); B05D 3/02 (2006.01); C08G 61/12 (2006.01); C08K 5/5419 (2006.01); C09D 165/00 (2006.01); C09D 171/08 (2006.01); G03F 1/56 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C08G 61/02 (2013.01); B05D 1/005 (2013.01); B05D 3/0254 (2013.01); C08G 61/12 (2013.01); C08K 5/5419 (2013.01); C09D 165/00 (2013.01); C09D 171/08 (2013.01); B05D 2518/00 (2013.01); C08G 2261/135 (2013.01); C08G 2261/1414 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/312 (2013.01); C08G 2261/3142 (2013.01); C08G 2261/3242 (2013.01); C08G 2261/90 (2013.01); G03F 1/56 (2013.01); G03F 7/70283 (2013.01);
Abstract

The present invention relates to a composition comprising; components a) b) and d); wherein, component a) is a metal compound having the structure (I), component b) is a spin on high carbon polymer, having a polymer backbone comprising mono-cyclic aromatic hydrocarbon, fused-ring ring hydrocarbon moieties, or mixtures of these, having a wt. % of carbon from about 81 wt. % to about 94 wt. %, which is soluble to at least about 5 wt. % in a spin casting solvent, and wherein at least one, of said mono-cyclic aromatic hydrocarbon or said fused-ring ring hydrocarbon moieties, present in said spin on high carbon polymer, is functionalized with at least one alkynyloxy moiety of structure (VIII), and component d) is a spin casting solvent. The present invention further relates to using this composition in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.


Find Patent Forward Citations

Loading…