Company Filing History:

28 out of 172

Mapper Lithography IP B.v.

patents

2 out of 4,883

Asml Netherlands B.v.

patents

1 out of 832,680

Other

patents

Years Active: 2007-2023

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31 patents (USPTO):Sort by Forward CitationsExplore Patents

1. RE49602 - Lithography system, sensor and measuring method (2023-08-07),

2. RE48046 - Lithography system, sensor and measuring method (2020-06-08),

3. RE46452 - Electrostatic lens structure (2017-06-26),

4. 9362084 - Electro-optical element for multiple beam alignment (2016-06-07),

5. RE45552 - Lithography system and projection method (2015-06-08),

6. 8921758 - Modulation device and charged particle multi-beamlet lithography system using the same (2014-12-30),

7. 8916837 - Charged particle lithography system with intermediate chamber (2014-12-23),

8. 8890095 - Reliability in a maskless lithography system (2014-11-18),

9. 8890094 - Projection lens arrangement (2014-11-18),

10. 8841920 - Capacitive sensing system (2014-09-23),

11. 8841636 - Modulation device and charged particle multi-beamlet lithography system using the same (2014-09-23),

12. 8759787 - Charged particle multi-beamlet lithography system with modulation device (2014-06-24),

13. 8716671 - Enhanced integrity projection lens assembly (2014-05-06),

14. 8648318 - Multiple beam charged particle optical system (2014-02-11),

15. 8638109 - Capacitive sensing system with differential pairs (2014-01-28),

Title: The Innovator Extraordinaire: Stijn Willem Herman Karel Steenbrink

Introduction:

Stijn Willem Herman Karel Steenbrink, a visionary inventor hailing from The Hague, NL, is making waves in the world of technology with an impressive portfolio of 31 patents. His groundbreaking work in lithography systems and sensor technology has revolutionized the field of charged particle beam systems.

Latest Patents:

Steenbrink's latest patents showcase his innovative prowess in lithography systems and sensor technology, focusing on measuring properties of charged particle beams in direct write lithography systems. These advancements highlight his dedication to pushing the boundaries of technological capabilities.

Career Highlights:

Throughout his illustrious career, Steenbrink has lent his expertise to prominent companies such as Mapper Lithography IP B.V. and ASML Netherlands B.V. His contributions have been instrumental in shaping the technological landscape of these organizations, cementing his reputation as a trailblazer in the industry.

Collaborations:

Steenbrink's innovative spirit is further amplified by his collaborations with industry peers such as Pieter Kruit and Marco Jan-Jaco Wieland. Together, they have worked on pioneering projects that have redefined the possibilities within the realm of charged particle beam systems.

Conclusion:

In conclusion, Stijn Willem Herman Karel Steenbrink stands as a beacon of innovation in the world of technology. His groundbreaking patents, combined with his prolific career and collaborative efforts, showcase his unwavering commitment to driving progress and pushing the boundaries of what is possible in the realms of lithography systems and sensor technology.

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11 patents (EPO):

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2 patents pending (EPO):

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.