The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Oct. 26, 2010
Marco Jan-jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.