Delft, Netherlands

Remco Jager

USPTO Granted Patents = 14 

 

Average Co-Inventor Count = 4.4

ph-index = 5

Forward Citations = 122(Granted Patents)


Location History:

  • PG Utrecht, NL (2010)
  • Utrecht, NL (2010 - 2012)
  • Delft, NL (2005 - 2013)
  • Rotterdam, NL (2013 - 2015)

Company Filing History:


Years Active: 2005-2015

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14 patents (USPTO):Explore Patents

Title: Remco Jager: Innovator in Lithography Technology

Introduction

Remco Jager is a prominent inventor based in Delft, Netherlands. He has made significant contributions to the field of lithography, holding a total of 14 patents. His work focuses on advanced lithography systems that enhance the precision and efficiency of pattern generation on target surfaces.

Latest Patents

Among his latest patents is a lithography system and projection method. This invention relates to a probe forming lithography system designed to generate patterns on target surfaces, such as wafers. It employs a black and white writing strategy, allowing for the division of patterns over a grid of cells. Each cell can be switched 'on' or 'off', enabling a probe to cover a larger surface area than a grid cell. Additionally, he has developed a modulation device and charged particle multi-beamlet lithography system. This system includes a beam generator for producing multiple beamlets, a beamlet blanker array for patterning these beamlets, and an optical fiber arrangement for guiding light beams carrying pattern data.

Career Highlights

Remco Jager is currently associated with Mapper Lithography IP B.V., where he continues to innovate in the field of lithography. His work has been instrumental in advancing the capabilities of lithography systems, making them more efficient and effective for various applications.

Collaborations

He has collaborated with notable colleagues, including Marco Jan-Jaco Wieland and Pieter Kruit. These partnerships have contributed to the development of cutting-edge technologies in the lithography domain.

Conclusion

Remco Jager's contributions to lithography technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in pattern generation and lithography systems.

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