The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Sep. 15, 2006
Remco Jager, PG Utrecht, NL;
Aukje Arianne Annette Kastelijn, BJ Eindhoven, NL;
Guido DE Boer, GP Someren, NL;
Marco Jan Jaco Wieland, GD Delft, NL;
Stijn Willem Karel Herman Steenbrink, AM Utrecht, NL;
Remco Jager, PG Utrecht, NL;
Aukje Arianne Annette Kastelijn, BJ Eindhoven, NL;
Guido de Boer, GP Someren, NL;
Marco Jan Jaco Wieland, GD Delft, NL;
Stijn Willem Karel Herman Steenbrink, AM Utrecht, NL;
Mapper Lithography IP B.V., CJ Delft, NL;
Abstract
The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.