For the Inventor, By the Inventor

Enter assignee name

Delft, Netherlands

Mapper Lithography IP B.v.

USPTO Granted Patents = 172

% Expired Patents = 8.1

EPO Patents = 55

Forward Citations = 1,333

Loading Chart...

Loading Chart...

93 inventors (with patents filed for the assignee):

Pieter Kruit (48 out of 94 patents)

Marco Jan-Jaco Wieland (45 out of 75 patents)

Guido De Boer (35 out of 38 patents)

4. Stijn Willem Herman Karel Steenbrink (28 out of 31 patents)

5. Alexander Hendrik Vincent Van Veen (20 out of 29 patents)

6. Niels Vergeer (17 out of 20 patents)

7. Remco Jager (14 out of 14 patents)

8. Teunis Van De Peut (13 out of 16 patents)

9. Hendrik Jan De Jong (12 out of 14 patents)

10. Jerry Johannes Martinus Peijster (11 out of 13 patents)

11. Johan Joost Koning (9 out of 14 patents)

12. Erwin Slot (9 out of 17 patents)

13. Bert Jan Kampherbeek (9 out of 9 patents)

14. Marcel Nicolaas Jacobus Van Kervinck (8 out of 21 patents)

15. Vincent Sylvester Kuiper (8 out of 22 patents)

Core Competencies:

Substrate Processing

Lithography System

Charged Particle

Multi-Beamlet

Alignment Sensor

Contamination Control

Wafer Exposure

Optical Fiber

Interferometer Module

Cooling Arrangement

Beam Measurement

Target Processing

172 patents: Sort by Forward Citations

1. 10324385 - Substrate processing apparatus (2019-06-18),

2. 10297420 - Charged particle lithography system (2019-05-21),

3. RE47287 - Lithography system, sensor, converter element and method of manufacture (2019-03-11),

4. 10144134 - Enclosure for a target processing machine (2018-12-04),

5. 10133186 - Method and apparatus for aligning substrates on a substrate support unit (2018-11-20),

6. 10110343 - Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame comprising corresponding n-bit symbols (2018-10-23),

7. 10096450 - Control system and method for lithography apparatus (2018-10-09),

8. 10087019 - Load lock system and method for transferring substrates in a lithography system (2018-10-02),

9. 10079206 - Fabricating unique chips using a charged particle multi-beamlet lithography system (2018-09-18),

10. 10078274 - Method and arrangement for handling and processing substrates (2018-09-18),

11. 10054863 - Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method (2018-08-21),

12. 10048599 - Adjustment assembly and substrate exposure system comprising such an adjustment assembly (2018-08-14),

13. 10037864 - High voltage shielding and cooling in a charged particle beam generator (2018-07-31),

14. 10008362 - Optical fiber feedthrough device and fiber path arrangement (2018-06-26),

15. 9981293 - Method and system for the removal and/or avoidance of contamination in charged particle beam systems (2018-05-29),

Company Overview

Mapper Lithography IP B.V., based in Delft, Netherlands, specializes in advanced charged particle lithography technologies. The company focuses on developing innovative solutions for substrate processing and wafer exposure, utilizing multi-beamlet systems to enhance precision and efficiency in lithography applications. Key technology areas include alignment sensors and contamination control, which are critical for maintaining high-quality manufacturing standards in semiconductor production and other high-tech industries.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

172 Patents

#4 in Delft

#51 in Netherlands

#4,825 in the World

Delft, Netherlands

Mapper Lithography IP B.v.

Forward Citations = 1,333

93 inventors:

Pieter Kruit (48 out of 94 patents)

Marco Jan-Jaco Wieland (45 out of 75 patents)

Guido De Boer (35 out of 38 patents)

4. Stijn Willem Herman Karel Steenbrink (28 out of 31 patents)

5. Alexander Hendrik Vincent Van Veen (20 out of 29 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Mapper Lithography IP B.v.. Retrieved from https://idiyas.com/company/mapper-lithography-ip-b-v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…