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Delft, Netherlands

Mapper Lithography IP B.v.

USPTO Granted Patents = 172

EPO Patents = 55

Forward Citations = 1,259

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109 inventors (with patents filed for the assignee):

Pieter Kruit (48 out of 90 patents)

Marco Jan-Jaco Wieland (45 out of 66 patents)

Guido De Boer (35 out of 38 patents)

4. Stijn Willem Herman Karel Steenbrink (28 out of 31 patents)

5. Alexander Hendrik Vincent Van Veen (20 out of 29 patents)

6. Niels Vergeer (17 out of 19 patents)

7. Remco Jager (14 out of 14 patents)

8. Teunis Van De Peut (13 out of 15 patents)

9. Hendrik Jan De Jong (12 out of 14 patents)

10. Jerry Johannes Martinus Peijster (11 out of 13 patents)

11. Johan Joost Koning (9 out of 14 patents)

12. Erwin Slot (9 out of 15 patents)

13. Bert Jan Kampherbeek (9 out of 9 patents)

14. Marcel Nicolaas Jacobus Van Kervinck (8 out of 20 patents)

15. Vincent Sylvester Kuiper (8 out of 20 patents)

Core Competencies:

Charged Particle Lithography

Substrate Processing

Lithography System

Multi-Beamlet Exposure

Alignment Sensor

Electrostatic Lens

Interferometer Module

Wafer Processing

Contamination Prevention

Beam Measurement

Optical Fiber Arrangement

Current Measurement System

172 patents: Sort by Forward Citations

1. 10324385 - Substrate processing apparatus (2019-06-18),

2. 10297420 - Charged particle lithography system (2019-05-21),

3. RE47287 - Lithography system, sensor, converter element and method of manufacture (2019-03-11),

4. 10144134 - Enclosure for a target processing machine (2018-12-04),

5. 10133186 - Method and apparatus for aligning substrates on a substrate support unit (2018-11-20),

6. 10110343 - Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame comprising corresponding n-bit symbols (2018-10-23),

7. 10096450 - Control system and method for lithography apparatus (2018-10-09),

8. 10087019 - Load lock system and method for transferring substrates in a lithography system (2018-10-02),

9. 10079206 - Fabricating unique chips using a charged particle multi-beamlet lithography system (2018-09-18),

10. 10078274 - Method and arrangement for handling and processing substrates (2018-09-18),

11. 10054863 - Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method (2018-08-21),

12. 10048599 - Adjustment assembly and substrate exposure system comprising such an adjustment assembly (2018-08-14),

13. 10037864 - High voltage shielding and cooling in a charged particle beam generator (2018-07-31),

14. 10008362 - Optical fiber feedthrough device and fiber path arrangement (2018-06-26),

15. 9981293 - Method and system for the removal and/or avoidance of contamination in charged particle beam systems (2018-05-29),

MAPPER Lithography IP B.V. is a leading provider of advanced lithography solutions for the semiconductor industry. With a focus on extreme ultraviolet (EUV) lithography, MAPPER develops and manufactures state-of-the-art lithography machines that enable high-resolution patterning on silicon wafers. Their innovative technology offers greater accuracy, throughput, and cost-effectiveness, empowering chip manufacturers to meet the demanding requirements of next-generation semiconductor devices. To learn more about MAPPER Lithography IP B.V. and their cutting-edge lithography solutions, please visit their website.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 2 2025

172 Patents

#4 in Delft

#49 in Netherlands

#4,681 in the World

Delft, Netherlands

Mapper Lithography IP B.v.

Forward Citations = 1,259

109 inventors:

Pieter Kruit (48 out of 90 patents)

Marco Jan-Jaco Wieland (45 out of 66 patents)

Guido De Boer (35 out of 38 patents)

4. Stijn Willem Herman Karel Steenbrink (28 out of 31 patents)

5. Alexander Hendrik Vincent Van Veen (20 out of 29 patents)

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