Delft, Netherlands

Marco Jan-Jaco Wieland

This inventor holds 75 USPTO granted patents and 33 published patent applications, plus 2 CIPO patents and 30 EPO patents, primarily in Charged Particle Lithography (CPC class H01J). Top assignees: Mapper Lithography IP B.v., Asml Netherlands B.v.. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marco Jan-Jaco Wieland. Retrieved from https://idiyas.com/inventor/marco-jan-jaco-wieland

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 75 

% Patents Active = 94.7

 

 

Average Co-Inventor Count = 2.1

ph-index = 12

Forward Citations = 774(Granted Patents)

Forward Citations (Not Self Cited) = 632(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • CJ Delft, NL (2014)
  • XK Delft, NL (2012 - 2018)
  • Delft, NL (2005 - 2024)

Company Filing History:


Years Active: 2005-2026

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Areas of Expertise:
Charged Particle
Lithography
Inspection Method
Aberration Correction
Electron-Optical Assembly
Vacuum Chamber
Multi-Beamlet
Deflection Scan
Substrate Processing
Sensor Measurement
Optical Device
Chip Fabrication
75 patents (USPTO):Explore Patents

Title: Marco Jan-Jaco Wieland: Pioneering Innovations in Charged Particle Technology

Introduction:

Marco Jan-Jaco Wieland, a dedicated inventor hailing from Delft, Netherlands, has carved a remarkable path in the world of technology with his relentless pursuit of excellence. With a staggering 61 patents to his name, Wieland's groundbreaking work continues to inspire the next generation of inventors and shape the future of technology.

Latest Patents:

Among his latest patents is a Charged Particle Assessment Tool, revolutionizing the inspection method in the field. This tool includes an objective lens projecting charged particle beams onto a sample, enhancing precision and efficiency in assessment. Additionally, his Vacuum Chamber Arrangement for Charged Particle Beam Generators showcases his innovative approach in optimizing charged particle beam generation processes.

Career Highlights:

Wieland's career is adorned with milestones achieved through his tenure at prominent companies such as Mapper Lithography IP B.V. and ASML Netherlands B.V. His expertise and ingenuity have significantly contributed to advancements in charged particle technology, solidifying his reputation as a trailblazer in the industry.

Collaborations:

In his quest for innovation, Wieland has collaborated with esteemed professionals like Alexander Hendrik Vincent Van Veen and Pieter Kruit. Together, they have spearheaded projects that have pushed the boundaries of technological possibilities and redefined industry standards.

Conclusion:

Marco Jan-Jaco Wieland's unwavering dedication to innovation and his remarkable portfolio of patents stand as a testament to his profound impact on the field of technology. His visionary work continues to inspire and pave the way for a future where ingenuity knows no bounds.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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