The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Mar. 17, 2023
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventor:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/12 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/12 (2013.01); H01J 37/28 (2013.01); H01J 2237/04756 (2013.01);
Abstract

A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to control a parameter of a respective sub-beam. The plurality of objective lenses are configured to project one of the plurality of charged-particle beams onto a sample. The controller controls the control lenses and the objective lenses so that the charged particles are incident on the sample with a desired landing energy, demagnification and/or beam opening angle.


Find Patent Forward Citations

Wieland, Marco Jan-Jaco. (2026). Charged particle assessment tool, inspection method (U.S. Patent No. 12537158). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12537158

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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