The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

May. 25, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/02 (2006.01); H01J 37/065 (2006.01); H01J 37/09 (2006.01); H01J 37/12 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/065 (2013.01); H01J 37/09 (2013.01); H01J 37/12 (2013.01); H01J 37/023 (2013.01); H01J 37/3177 (2013.01); H01J 2237/0213 (2013.01); H01J 2237/0264 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/1207 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/1825 (2013.01); H01J 2237/188 (2013.01); H01J 2237/31774 (2013.01); H01J 2237/31793 (2013.01);
Abstract

A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking 5 part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.


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