San Jose, CA, United States of America

Kartik Ramaswamy

This inventor holds 268 USPTO granted patents and 114 published patent applications and 1 EPO patent, primarily in Plasma Processing (CPC class H01J37-32183). Top assignees: Applied Materials, Inc., Other. Active years: 2002-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kartik Ramaswamy. Retrieved from https://idiyas.com/inventor/kartik-ramaswamy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 268 

% Patents Active = 75.0

 

Average Co-Inventor Count = 5.2

ph-index = 40

Forward Citations = 7,967(Granted Patents)

Forward Citations (Not Self Cited) = 7,185(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Santa Clara, CA (US) (2002 - 2011)
  • San Jose, CA (US) (2006 - 2024)

Company Filing History:


Years Active: 2002-2026

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Areas of Expertise:
Radio Frequency
Plasma Processing
Impedance Matching
High-Power Density
Inductively Coupled
Digital Control
Substrate Processing
Pulsed Voltage
Ion Energy Control
Electrostatic Chuck
Wafer Processing
Plasma Uniformity
268 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Kartik Ramaswamy - Pioneering Technological Advancements

Introduction:

In the realm of innovations and groundbreaking technologies, Kartik Ramaswamy has emerged as a leading figure. With an impressive track record, extensive experience, and a passion for pushing the boundaries of technological possibilities, Kartik Ramaswamy has made significant contributions in the field. This article delves into his latest patents, career highlights, and collaborations, highlighting his exceptional expertise and notable achievements.

Latest Patents:

Kartik Ramaswamy's latest inventions include two remarkable patents: "Methods and Apparatus for Processing a Substrate" and "Process Monitor Device Having a Plurality of Sensors Arranged in Concentric Circles." These patents showcase his innovative approach to plasma processing and process monitoring, respectively.

In the first patent, Kartik Ramaswamy proposes advanced methods and apparatus for processing substrates. The invention outlines a novel matching network that optimizes the utilization of radio frequency (RF) signals within plasma processing chambers, thereby enhancing the efficiency and precision of substrate processing.

The second patent demonstrates his focus on process monitoring devices. Kartik Ramaswamy's invention includes a network interface device integrated with a substrate, enabling wireless transmission of output signals from sensors to an external computer. This innovation revolutionizes process monitoring during various operations, improving efficiency and real-time data analysis.

Career Highlights:

Kartik Ramaswamy has garnered a commendable portfolio of 204 patents throughout his illustrious career. His expertise extends across multiple disciplines, including plasma processing, semiconductor technology, and process monitoring. His invaluable contributions to the field of innovation have earned him recognition and admiration among peers.

Collaborations:

Kartik Ramaswamy has collaborated with prestigious companies to bring his inventive ideas to fruition. Notably, he has worked with Applied Materials, Inc., a global leader in semiconductor equipment manufacturing. His association with Applied Materials, Inc. has allowed him to translate his expertise into practical applications, furthering the development of cutting-edge technologies. Furthermore, he has also collaborated with industry professionals such as Kenneth S Collins and Andrew Nguyen, leveraging their collective knowledge to drive remarkable advancements.

Conclusion:

Kartik Ramaswamy's significant achievements and inventive prowess have positioned him as a prominent figure in the world of technology and patents. His latest patents demonstrate his commitment to pushing the boundaries of innovation, exploring new avenues for substrate processing and process monitoring. With an extensive career and collaborations with esteemed organizations, Kartik Ramaswamy continues to inspire the next generation of innovators and inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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