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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10054863 B1

PDFFull Text
Date of Patent:
Aug. 21, 2018

Filed:

Feb. 25, 2015

Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method

Applicant:

Mapper Lithography Ip B.v., Delft, NL;

Inventors:

Guido De Boer, Leerdam, NC (US);

Niels Vergeer, Delft, NL;

Assignee:

MAPPER LITHOGRAPHY IP B.V., Delft, NL;

Attorneys:

Hoyng Rokh Monegier LLP

David P. Owen

Primary Examiner:

Gordon J Stock, Jr

Int. Cl.
CPC ...
G03F 9/00 (2006.01); B82Y 40/00 (2011.01); H01J 37/317 (2006.01); H01J 37/04 (2006.01); B82Y 10/00 (2011.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7076 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 9/7046 (2013.01); G03F 9/7084 (2013.01); H01J 37/3045 (2013.01); H01J 37/3174 (2013.01);
Abstract

The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises:

Find Patent Forward Citations

De Boer, Guido. (2018). Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method (U.S. Patent No. 10054863). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10054863

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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