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For the Inventor, By the Inventor

Rotterdam, Netherlands

Niels Vergeer

USPTO Granted Patents = 19 

 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Delft, NL (2018)
  • Rotterdam, NL (2013 - 2023)

Company Filing History:

goldMedal17 out of 172 
 
Mapper Lithography IP B.v.
 patents
silverMedal2 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2013-2023

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19 patents (USPTO):Explore Patents
1. RE49732 - Charged particle lithography system with alignment sensor and beam measurement sensor (2023-11-21),
2. RE49241 - Lithography system and method for processing a target, such as a wafer (2022-10-10),
3. 10054863 - Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method (2018-08-21),
4. 9760028 - Lithography system and method for processing a target, such as a wafer (2017-09-12),
5. 9690215 - Interferometer module (2017-06-27),
6. 9678443 - Lithography system with differential interferometer module (2017-06-13),
7. 9665014 - Charged particle lithography system with alignment sensor and beam measurement sensor (2017-05-30),
8. 9551563 - Multi-axis differential interferometer (2017-01-24),
9. 9484188 - Individual beam pattern placement verification in multiple beam lithography (2016-11-01),
10. 9395636 - Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer (2016-07-19),
11. 9395635 - Position determination in a lithography system using a substrate having a partially reflective position mark (2016-07-19),
12. 9383662 - Lithography system for processing at least a part of a target (2016-07-05),
13. 9261800 - Alignment of an interferometer module for use in an exposure tool (2016-02-16),
14. 9201315 - Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system (2015-12-01),
15. 9069265 - Interferometer module (2015-06-30),

Title: The Innovative Journey of Niels Vergeer from Rotterdam

Introduction: Niels Vergeer, a brilliant inventor hailing from Rotterdam, NL, has made significant contributions to the field of charged particle lithography systems. With an impressive portfolio of 19 patents, Vergeer continues to push the boundaries of innovation in technology.

Latest Patents:

One of Vergeer's latest patents includes a Charged Particle Lithography System with alignment sensor and beam measurement sensor. This cutting-edge system allows for the precise transfer of patterns onto substrates using multiple charged particle beamlets. Another innovative patent is the Lithography System and Method for processing a target, such as a wafer, which enhances the efficiency of target processing systems.

Career Highlights:

During his career, Vergeer has worked with esteemed companies such as Mapper Lithography IP B.V. and ASML Netherlands B.V. His expertise and dedication have led to the development of groundbreaking technologies in the field of lithography systems.

Collaborations:

Throughout his journey, Vergeer has collaborated with talented individuals such as Guido de Boer and Godefridus Cornelius Antonius Couweleers. Together, they have synergized their skills and knowledge to drive innovation and bring revolutionary ideas to life.

Conclusion:

Niels Vergeer's exceptional talent and passion for innovation have shaped the landscape of charged particle lithography systems. His relentless pursuit of excellence and collaboration with industry experts continue to inspire future generations of inventors.

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