The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Apr. 23, 2012
Guido DE Boer, Leerdam, NL;
Niels Vergeer, Rotterdam, NL;
Godefridus Cornelius Antonius Couweleers, Delft, NL;
Laurens Plandsoen, Delft, NL;
Cor Verburg, Delft, NL;
Guido De Boer, Leerdam, NL;
Niels Vergeer, Rotterdam, NL;
Godefridus Cornelius Antonius Couweleers, Delft, NL;
Laurens Plandsoen, Delft, NL;
Cor Verburg, Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.