Delft, Netherlands

Godefridus Cornelius Antonius Couweleers

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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8 patents (USPTO):Explore Patents

Title: Godefridus Cornelius Antonius Couweleers: Innovator in Lithography Technology

Introduction

Godefridus Cornelius Antonius Couweleers is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of lithography, holding a total of 8 patents. His work primarily focuses on differential interferometer modules and their applications in lithography systems.

Latest Patents

Couweleers' latest patents include an innovative differential interferometer module designed for measuring the direction of displacement between a reference mirror and a measurement mirror. This module is capable of emitting three reference beams towards a first mirror and three measurement beams towards a second mirror, allowing for precise displacement measurements. Additionally, the module can measure relative rotation around two perpendicular axes. Another significant patent involves a lithography system that incorporates this differential interferometer module, enhancing the accuracy of target displacement and rotation measurements.

Career Highlights

Throughout his career, Couweleers has worked with prominent companies in the lithography sector, including Mapper Lithography IP B.V. and ASML Netherlands B.V. His expertise in optical systems and interferometry has positioned him as a key player in advancing lithography technology.

Collaborations

Couweleers has collaborated with notable colleagues such as Niels Vergeer and Guido De Boer, contributing to various projects that push the boundaries of lithography and optical measurement technologies.

Conclusion

Godefridus Cornelius Antonius Couweleers is a distinguished inventor whose work in differential interferometer modules and lithography systems has significantly impacted the field. His innovative patents and collaborations continue to shape the future of optical measurement technologies.

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