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For the Inventor, By the Inventor

Delft, Netherlands

Godefridus Cornelius Antonius Couweleers

This inventor holds 8 USPTO granted patents and 1 published patent application and 6 EPO patents. Top assignee: Mapper Lithography IP B.v.. Active years: 2015-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Godefridus Cornelius Antonius Couweleers. Retrieved from https://idiyas.com/inventor/godefridus-cornelius-antonius-couweleers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 8 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:

goldMedal8 out of 172 
 
Mapper Lithography IP B.v.
 patents

Years Active: 2015-2017

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8 patents (USPTO):Explore Patents
1. 9690215 - Interferometer module (2017-06-27),
2. 9678443 - Lithography system with differential interferometer module (2017-06-13),
3. 9551563 - Multi-axis differential interferometer (2017-01-24),
4. 9395636 - Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer (2016-07-19),
5. 9383662 - Lithography system for processing at least a part of a target (2016-07-05),
6. 9261800 - Alignment of an interferometer module for use in an exposure tool (2016-02-16),
7. 9201315 - Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system (2015-12-01),
8. 9069265 - Interferometer module (2015-06-30),

Title: Godefridus Cornelius Antonius Couweleers: Innovator in Lithography Technology

Introduction

Godefridus Cornelius Antonius Couweleers is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of lithography, holding a total of 8 patents. His work primarily focuses on differential interferometer modules and their applications in lithography systems.

Latest Patents

Couweleers' latest patents include an innovative differential interferometer module designed for measuring the direction of displacement between a reference mirror and a measurement mirror. This module is capable of emitting three reference beams towards a first mirror and three measurement beams towards a second mirror, allowing for precise displacement measurements. Additionally, the module can measure relative rotation around two perpendicular axes. Another significant patent involves a lithography system that incorporates this differential interferometer module, enhancing the accuracy of target displacement and rotation measurements.

Career Highlights

Throughout his career, Couweleers has worked with prominent companies in the lithography sector, including Mapper Lithography IP B.V. and ASML Netherlands B.V. His expertise in optical systems and interferometry has positioned him as a key player in advancing lithography technology.

Collaborations

Couweleers has collaborated with notable colleagues such as Niels Vergeer and Guido De Boer, contributing to various projects that push the boundaries of lithography and optical measurement technologies.

Conclusion

Godefridus Cornelius Antonius Couweleers is a distinguished inventor whose work in differential interferometer modules and lithography systems has significantly impacted the field. His innovative patents and collaborations continue to shape the future of optical measurement technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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