The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
May. 11, 2012
Niels Vergeer, Rotterdam, NL;
Guido DE Boer, Leerdam, NL;
Godefridus Cornelius Antonius Couweleers, Delft, NL;
Laurens Plandsoen, Delft, NL;
Cor Verburg, Delft, NL;
Niels Vergeer, Rotterdam, NL;
Guido de Boer, Leerdam, NL;
Godefridus Cornelius Antonius Couweleers, Delft, NL;
Laurens Plandsoen, Delft, NL;
Cor Verburg, Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.