The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Sep. 26, 2013
Mapper Lithography Ip B.v., Delft, NL;
Godefridus Cornelius Antonius Couweleers, Delft, NL;
Thomas Adriaan Ooms, Delfgauw, NL;
Niels Vergeer, Rotterdam, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a multi-axis differential interferometer () for measuring a displacement and/or rotation between a first reflective surface () and a second reflective surface (), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one () of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one () of said reflective surfaces, said interferometer () comprising: a first optical module () and a second optical module (), wherein each optical module () is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.