Delfgauw, Netherlands

Thomas Adriaan Ooms

USPTO Granted Patents = 3 


Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016-2017

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3 patents (USPTO):Explore Patents

Title: Thomas Adriaan Ooms: Innovator in Lithography Systems

Introduction

Thomas Adriaan Ooms is a notable inventor based in Delfgauw, Netherlands. He has made significant contributions to the field of lithography, particularly through his innovative patents. With a total of 3 patents, Ooms has established himself as a key figure in the development of advanced optical systems.

Latest Patents

One of his latest patents is a "Lithography system with differential interferometer module." This invention relates to a lithography system that includes an optical column and a moveable target carrier for displacing a target, such as a wafer. The differential interferometer module is designed to emit three reference beams towards a first mirror and three measurement beams towards a second mirror, allowing for precise determination of displacement between the mirrors. Additionally, the module can measure relative rotation around two perpendicular axes.

Another significant patent is the "Multi-axis differential interferometer." This invention is aimed at measuring displacement and/or rotation between two reflective surfaces using at least two pairs of beams. Each pair consists of a measurement beam directed at one reflective surface and a reference beam directed at another. The interferometer comprises two optical modules, each configured to create one of the pairs from a coherent beam. This invention also includes a lithography system that incorporates such an interferometer.

Career Highlights

Throughout his career, Thomas Ooms has worked with prominent companies in the lithography industry, including Mapper Lithography IP B.V. and ASML Netherlands B.V. His work has significantly impacted the development of lithography technologies, making him a respected figure in the field.

Collaborations

Ooms has collaborated with notable professionals such as Niels Vergeer and Godefridus Cornelius Antonius Couweleers. These collaborations have further enhanced his contributions to the field of lithography.

Conclusion

Thomas Adriaan Ooms is a distinguished inventor whose work in lithography systems has led to innovative patents that advance the technology. His contributions continue to influence the industry and inspire future innovations.

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