The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Mar. 08, 2013
Applicant:
Mapper Lithography Ip B.v., Delft, NL;
Inventor:
Niels Vergeer, Rotterdam, NL;
Assignee:
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 9/00 (2006.01); H01J 37/317 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
G03F 9/00 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 9/7088 (2013.01); H01J 37/3177 (2013.01); H01J 37/3045 (2013.01); H01J 2237/30438 (2013.01);
Abstract
A method for operating a target processing system for processing a target () on a chuck (), the method comprising providing at least a first chuck position mark () and a second chuck position mark () on the chuck (); providing an alignment sensing system () arranged for detecting the first and second chuck position marks (), the alignment sensing system () comprising at least a first alignment sensor () and a second alignment sensor (); moving the chuck () to a first position based on at least one measurement of the alignment sensing system (); and measuring at least one value related to the first position of the chuck.