The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Mar. 09, 2007
Pieter Kruit, Delft, NL;
Remco Jager, Utrecht, NL;
Stijn Willem Karel Herman Steenbrink, Utrecht, NL;
Marco Jan-jaco Wieland, Delft, NL;
Pieter Kruit, Delft, NL;
Remco Jager, Utrecht, NL;
Stijn Willem Karel Herman Steenbrink, Utrecht, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Mapper Lithography IP B.V., XK Delft, NL;
Abstract
The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched 'on' or 'off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.