The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2005
Filed:
Oct. 24, 2003
Jan-jaco Marco Wieland, Delft, NL;
Johannes Christiaan Van 't Spijker, Delft, NL;
Remco Jager, Delft, NL;
Pieter Kruit, Delft, NL;
Jan-Jaco Marco Wieland, Delft, NL;
Johannes Christiaan van 't Spijker, Delft, NL;
Remco Jager, Delft, NL;
Pieter Kruit, Delft, NL;
Mapper Lithography IP B.V., , NL;
Abstract
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.