The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Oct. 26, 2010
Marco Jan-jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, Den Haag, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, Den Haag, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.