The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Oct. 26, 2011
Marco Jan-jaco Wieland, Delft, NL;
Teunis Van DE Peut, Leusden, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Remco Jager, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Ralph Van Melle, Hellevoetsluis, NL;
Henk Derks, Waalre, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Teunis Van De Peut, Leusden, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Remco Jager, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Ralph Van Melle, Hellevoetsluis, NL;
Henk Derks, Waalre, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.