The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Nov. 14, 2011
Marco Jan-jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, Den Haag, NL;
Teunis Van DE Peut, Leusden, NL;
Henk Derks, Waalre, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Remco Jager, Rotterdam, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, Den Haag, NL;
Teunis van de Peut, Leusden, NL;
Henk Derks, Waalre, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.