The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Oct. 24, 2013
Applicant:
Mapper Lithography Ip B.v., Delft, NL;
Inventors:
Laura Dinu-Gürtler, Delft, NL;
Willem Henk Urbanus, Culemborg, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Assignee:
Mapper Lithography IP B.V., Delft, NL;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/10 (2006.01); G03B 27/26 (2006.01); G21K 5/04 (2006.01); H01J 37/317 (2006.01); H01J 37/301 (2006.01); H01J 37/16 (2006.01); B82Y 10/00 (2011.01); H01J 37/09 (2006.01); H01J 37/18 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 37/3177 (2013.01); H01J 37/301 (2013.01); H01J 37/16 (2013.01); B82Y 10/00 (2013.01); H01J 37/09 (2013.01); H01J 2237/188 (2013.01); H01J 37/18 (2013.01); B82Y 40/00 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/0453 (2013.01);
Abstract
A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a source for generating a charged particle beam, a first chamber housing the source, a collimating system for collimating the charged particle beam, a second chamber housing the collimating system, and a first aperture array element for generating a plurality of charged particle subbeams from the collimated charged particle beam.