The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2014
Filed:
Oct. 28, 2013
Mapper Lithography Ip B.v., Delft, NL;
Guido De Boer, Leerdam, NL;
Johnny Joannes Jacobus Van Baar, Hengelo, NL;
Kaustubh Prabodh Padhye, Zoetermeer, NL;
Robert Mossel, Capelle a/d IJssel, NL;
Niels Vergeer, Rotterdam, NL;
Stijn Willem Herman Karel Steenbrink, Den Haag, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.