The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Mar. 24, 2011
Pieter Kruit, Delft, NL;
Yanxia Zhang, Delft, NL;
Martijn J. Van Bruggen, Delft, NL;
Stijn Willem Herman Karel Steenbrink, Delft, NL;
Pieter Kruit, Delft, NL;
Yanxia Zhang, Delft, NL;
Martijn J. Van Bruggen, Delft, NL;
Stijn Willem Herman Karel Steenbrink, Delft, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.