The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2020
Filed:
Aug. 25, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Pieter Kruit, Delft, NL;
Erwin Slot, Zoetermeer, NL;
Tijs Frans Teepen, Tilburg, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Stijn Willem Herman Karel Steenbrink, The Hague, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/00 (2005.12); H01J 37/304 (2005.12); B82Y 10/00 (2010.12); H01J 37/317 (2005.12); B82Y 40/00 (2010.12);
U.S. Cl.
CPC ...
H01J 37/3045 (2012.12); B82Y 10/00 (2012.12); B82Y 40/00 (2012.12); H01J 37/3177 (2012.12); H01J 2237/2446 (2012.12); H01J 2237/30433 (2012.12); H01J 2237/31757 (2012.12);
Abstract
Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which