Tilburg, Netherlands

Tijs Frans Teepen

This inventor holds 5 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignees: Mapper Lithography IP B.v., Asml Netherlands B.v.. Active years: 2011-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tijs Frans Teepen. Retrieved from https://idiyas.com/inventor/tijs-frans-teepen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 25(Granted Patents)


Location History:

  • RB Tilburg, NL (2011)
  • Tilburg, NL (2014 - 2023)

Company Filing History:


Years Active: 2011-2023

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5 patents (USPTO):Explore Patents

Title: The Ingenious Inventor: Tijs Frans Teepen

Introduction:

Tijs Frans Teepen, a brilliant inventor hailing from Tilburg, NL, has made significant contributions to the field of lithography systems through his innovative patents and groundbreaking work. With a total of 5 patents to his name, Tijs is a pioneer in the development of sensor technologies and measuring methods in the realm of charged particle beam systems.

Latest Patents:

His latest patents include a series of inventions related to Lithography systems, sensors, and methods for measuring properties of charged particle beams. These inventions have paved the way for advancements in direct write lithography systems, showcasing Tijs's expertise and creativity in the field.

Career Highlights:

Tijs Frans Teepen has been associated with prominent companies in the industry, including Mapper Lithography IP B.V. and ASML Netherlands B.V. His tenure at these esteemed organizations has been marked by groundbreaking research and development in the field of lithography systems, solidifying his reputation as a leading innovator in the industry.

Collaborations:

Throughout his career, Tijs has collaborated with esteemed professionals such as Pieter Kruit and Erwin Slot. Together, they have worked on cutting-edge projects, pushing the boundaries of technology and innovation in the realm of charged particle beam systems.

Conclusion:

In conclusion, Tijs Frans Teepen's exceptional contributions to the field of lithography systems, sensor technologies, and charged particle beam systems have left an indelible mark on the industry. His inventive spirit and unwavering dedication to pushing the boundaries of what is possible have established him as a luminary in the world of innovation and invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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