Mapper Lithography IP B.v.

Asml Netherlands B.v.

Tijs Frans Teepen

Pieter Kruit

Erwin Slot

Marco Jan-Jaco Wieland

Stijn Willem Herman Karel Steenbrink

Guido De Boer

Alexander Hendrik Vincent Van Veen

Remco Jager

Jerry Johannes Martinus Peijster

Marco Jan Jaco Wieland

Stijn Willem Karel Herman Steenbrink

Sander Baltussen

Hugo Martijn Makkink

Stijin Willem Herman Karel Steenbrink

Willem Maurits Weeda

Joris Anne Henri Van Nieuwstadt

Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which

Lithography system, sensor and measuring method

A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber

Growing community of inventors

Tilburg, Netherlands

Tijs Frans Teepen