The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2014

Filed:

Jan. 09, 2013
Applicant:

Mapper Lithography Ip B.v., Delft, NL;

Inventors:

Pieter Kruit, Delft, NL;

Erwin Slot, Zoetermeer, NL;

Tijs Frans Teepen, Tilburg, NL;

Marco Jan-Jaco Wieland, Delft, NL;

Stijin Willem Herman Karel Steenbrink, Den Haag, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/00 (2005.12);
U.S. Cl.
CPC ...
Abstract

Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which


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