Stephan Muellender

USPTO Granted Patents = 16 (Patent Applications = 1)

EPO Patents = 4 (Patent Applications = 4)

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 16(Granted Patents)

Company Filing History:

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2008-2018

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9996005 - Reflective optical element and optical system for EUV lithography (2018-06-12),

2. 9778576 - Microlithography illumination system and microlithography illumination optical unit (2017-10-03),

3. 9720329 - Projection objective of a microlithographic projection exposure apparatus (2017-08-01),

4. 9606446 - Reflective optical element for EUV lithography and method of manufacturing a reflective optical element (2017-03-28),

5. 9494718 - Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective (2016-11-15),

6. 9341958 - Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror (2016-05-17),

7. 9304405 - Microlithography illumination system and microlithography illumination optical unit (2016-04-05),

8. 9285515 - Imaging optical system and projection exposure system including the same (2016-03-15),

9. 8944615 - Projection objective and method for its manufacture (2015-02-03),

10. 8605255 - Imaging optical system and projection exposure system including the same (2013-12-10),

11. 8585224 - Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination (2013-11-19),

12. 8457281 - Method for producing a multilayer coating, optical element and optical arrangement (2013-06-04),

13. 8382301 - Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination (2013-02-26),

14. 8164077 - Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element (2012-04-24),

15. 7763870 - Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements (2010-07-27),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can help you with that. Here is the article about inventor Stephan Muellender based on the provided data:

Title: Unveiling the Ingenious Mind of Stephan Muellender

Introduction:

Stephan Muellender is a prolific inventor hailing from Aalen, Germany, whose innovative spirit has led to the successful acquisition of an impressive portfolio of patents. With a total of 16 patents to his name, Muellender has significantly contributed to the field of optical technology and microlithography.

Latest Patents:

Muellender's recent patents include groundbreaking inventions such as the Reflective Optical Element and Optical System for EUV Lithography. This invention aims to enhance the longevity and performance of reflective optical elements in EUV lithography devices by incorporating a protective layer system with specific material compositions and thickness.

Additionally, his Microlithography Illumination System and Microlithography Illumination Optical Unit patent revolutionizes the illumination process in microlithography by introducing facet pairs with polarization elements to control the polarization state of illumination light, thereby optimizing the object field illumination.

Career Highlights:

During his illustrious career, Stephan Muellender has made significant contributions to renowned companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. His expertise and innovative prowess have been instrumental in shaping the technological advancements in the field of optical systems and lithography.

Collaborations:

Muellender has collaborated with esteemed colleagues including Hartmut Enkisch and Hans-Juergen Mann, who have collectively worked towards the realization of groundbreaking inventions in the realm of optical technology and microlithography. Their collaborative efforts have paved the way for cutting-edge solutions in the industry.

Conclusion:

In conclusion, Stephan Muellender stands as a visionary inventor whose relentless pursuit of innovation has yielded remarkable results in the domain of optical technologies and microlithography. His patents and contributions not only showcase his technical acumen but also highlight his dedication to pushing the boundaries of scientific advancement.

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1 patent pending:

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4 patents (EPO):

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4 patents pending (EPO):

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