The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Sep. 20, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 17/06 (2006.01); G21K 1/06 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); B82Y 10/00 (2013.01); G02B 17/06 (2013.01); G02B 17/0663 (2013.01); G03F 7/70191 (2013.01); G03F 7/70308 (2013.01); G03F 7/70316 (2013.01); G21K 1/062 (2013.01); G21K 2201/061 (2013.01); G21K 2201/067 (2013.01);
Abstract
A deflection mirror (, etc.) for a microlithography projection exposure apparatus for illuminating an object field in an object plane of the projection exposure apparatus () using the deflection mirror with grazing incidence. This deflection mirror has a substrate (, etc.) and at least one layer system (, etc.), and during operation light impinges on said mirror at a multiplicity of angles of incidence, wherein the layer system is designed such that, for light having a wavelength of less than 30 nm, for an angle of incidence of between 55° and 70°, the variation of the reflectivity is less than 20%, in particular less than 12%.