The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2018

Filed:

Nov. 18, 2013
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Dirk Heinrich Ehm, Lauchheim, DE;

Peter Huber, Holzschwang, DE;

Stephan Muellender, Aalen, DE;

Gisela Von Blanckenhagen, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 1/10 (2015.01); G02B 5/08 (2006.01); G02B 19/00 (2006.01); G02B 27/00 (2006.01); G21K 1/06 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/2008 (2013.01); B82Y 10/00 (2013.01); G02B 1/105 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G02B 19/0095 (2013.01); G02B 27/0006 (2013.01); G03F 7/2004 (2013.01); G03F 7/70316 (2013.01); G03F 7/70916 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01); G21K 2201/067 (2013.01); Y10T 428/265 (2015.01);
Abstract

In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element () having a reflective surface () with a multilayer system () and in the case of which the reflective surface () has a protective layer system () with an uppermost layer () composed of silicon carbide or ruthenium, the protective layer system () having a thickness of between 5 nm and 25 nm.


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