The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Sep. 14, 2007
Dirk Heinrich Ehm, Aalen, DE;
Hermann Bieg, Huettlingen, DE;
Hans-juergen Mann, Oberkochen, DE;
Stephan Muellender, Aalen, DE;
Johannes Hubertus Josephina Moors, Helmond, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Dirk Heinrich Ehm, Aalen, DE;
Hermann Bieg, Huettlingen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Stephan Muellender, Aalen, DE;
Johannes Hubertus Josephina Moors, Helmond, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.