The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2013

Filed:

Dec. 10, 2010
Applicants:

Hartmut Enkisch, Aalen, DE;

Stephan Muellender, Aalen, DE;

Martin Endres, Koenigsbronn, DE;

Inventors:

Hartmut Enkisch, Aalen, DE;

Stephan Muellender, Aalen, DE;

Martin Endres, Koenigsbronn, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for producing a multilayer coating () for reflecting radiation in the soft X-ray or EUV wavelength range on an optical element () operated at an operating temperature (T) of 30° C. or more, including: determining an optical design for the multilayer coating () which defines an optical desired layer thickness (nd) of the layers () of the multilayer coating () at the operating temperature (T), and applying the layers () of the multilayer coating () with an optical actual layer thickness (nd) chosen such that a layer thickness change(nd−nd) caused by thermal expansion of the layers () between the coating temperature (T) and the operating temperature (T) is compensated for. Also provided are an associated optical element () and a projection exposure apparatus having at least one such optical element ().


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