The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Feb. 10, 2013
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Asml Netherlands B.v., Veldhoven, NL;
Dirk Heinrich Ehm, Lauchheim, DE;
Stephan Muellender, Aalen, DE;
Thomas Stein, Oberkochen, DE;
Johannes Hubertus Josephina Moors, Helmond, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Dieter Kraus, Oberkochen, DE;
Richard Versluis, Delft, NL;
Marcus Gerhardus Hendrikus Meijerink, The Hague, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands b.V., Veldhoven, NL;
Abstract
An optical arrangement, e.g. a projection exposure apparatus () for EUV lithography, includes: a housing () enclosing an interior space (); at least one, preferably reflective optical element (--) arranged in the housing (); at least one vacuum generating unit () for the interior space () of the housing (); and at least one vacuum housing (-) arranged in the interior space () and enclosing at least the optical surface () of the optical element (--). A contamination reduction unit is associated with the vacuum housing (-) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface () in relation to the partial pressure of the contaminating substances in the interior space ().