Oberkochen, Germany

Dieter Kraus

USPTO Granted Patents = 8 


Average Co-Inventor Count = 5.4

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Munich, DE (2014)
  • Oberkochen, DE (2011 - 2015)
  • München, DE (2015)

Company Filing History:


Years Active: 2011-2015

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8 patents (USPTO):Explore Patents

Title: A Closer Look at Dieter Kraus: Pioneering Innovator in EUV Lithography

Introduction: Dieter Kraus, a distinguished inventor based in Oberkochen, Germany, has made significant contributions to the field of EUV lithography. With a total of 8 patents to his name, Kraus continues to push boundaries in optical component cleaning and contaminant detection within EUV lithography devices.

Latest Patents:

1. Cleaning module for EUV lithography device: Kraus's innovative cleaning module utilizes molecular hydrogen and a heating filament to produce atomic hydrogen and hydrogen ions for gentle and effective cleaning of optical components in EUV lithography devices.

2. Detection of contaminating substances in EUV lithography apparatus: He developed a method and apparatus for detecting contaminating substances in the residual gas atmosphere of an EUV lithography apparatus, enhancing the efficiency and reliability of the lithography process.

Career Highlights: Kraus's expertise in EUV lithography has led him to work with reputable companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. His dedication to advancing lithography technology has earned him recognition as a trailblazer in the industry.

Collaborations: Throughout his career, Dieter Kraus has collaborated with accomplished professionals in the field, including Dirk Heinrich Ehm and Stefan-Wolfgang Schmidt. Together, they have tackled complex challenges and pioneered groundbreaking solutions in EUV lithography.

Conclusion: Dieter Kraus's innovative spirit and technical acumen have positioned him as a leading figure in the realm of EUV lithography. His patents and contributions continue to shape the future of lithography technology, demonstrating his unwavering commitment to innovation and excellence in the field.

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