The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Sep. 16, 2010
Stefan Hembacher, Bobingen, DE;
Dieter Kraus, München, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-wolfgang Schmidt, Aalen, DE;
Stefan Koehler, Rainau, DE;
Almut Czap, Aalen, DE;
Stefan Wiesner, Lauchheim, DE;
Hin Yiu Anthony Chung, Elchingen, DE;
Stefan Hembacher, Bobingen, DE;
Dieter Kraus, München, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-Wolfgang Schmidt, Aalen, DE;
Stefan Koehler, Rainau, DE;
Almut Czap, Aalen, DE;
Stefan Wiesner, Lauchheim, DE;
Hin Yiu Anthony Chung, Elchingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
In order to clean optical components () inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, () arranged to apply an electric and/or magnetic field, downstream of the heating filament () in the direction of flow of the hydrogen (). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile