This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag. Active years: 2009-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Aalen-.Ebnat, DE (2009)
- Rainau, DE (2014 - 2015)
Company Filing History:
Years Active: 2009-2015
Title: Innovations of Inventor Stefan Koehler
Introduction
Stefan Koehler is an accomplished inventor based in Rainau, Germany. With a remarkable portfolio of three patents to his name, he has significantly contributed to the field of EUV lithography, particularly in efficient cleaning methods for optical components.
Latest Patents
Koehler's latest innovations include two groundbreaking patents:
1. **Cleaning module, EUV lithography device and method for the cleaning thereof**: This invention introduces a cleaning module specifically designed for EUV lithography devices. It features a supply line for molecular hydrogen and a heating filament that generates atomic hydrogen and hydrogen ions for the gentle cleaning of optical components. Additionally, the module contains an element to apply an electric and/or magnetic field downstream of the heating filament to control the ion beam effectively.
2. **EUV lithography device and method for processing an optical element**: This patent presents an EUV lithography device equipped with an illumination mechanism and a projection device for imaging masks onto light-sensitive substrates. It includes a processing device capable of processing optical elements, such as masks, at specific points within the device. The processing device is enhanced with a particle generator to create a particle beam or an electron beam, along with a high-frequency generator for activating gas components.
Career Highlights
Stefan Koehler has held significant roles at prominent companies, including Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His work has consistently pushed the boundaries of optical technology, exemplifying a dedication to advancing the field of EUV lithography.
Collaborations
Throughout his career, Koehler has worked alongside esteemed colleagues, including Dieter Kraus and Dirk Heinrich Ehm. These collaborations have contributed to the successful development and implementation of innovative technologies in the industry.
Conclusion
Inventor Stefan Koehler has demonstrated exceptional creativity and technical expertise in his field. His latest inventions play a crucial role in enhancing the efficiency of EUV lithography devices, paving the way for continued advancements in optical component processing. As innovations in technology evolve, it is clear that Koehler's contributions will have lasting impacts on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile