Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Stefan Koehler

Dirk Heinrich Ehm

Stefan-Wolfgang Schmidt

Hin Yiu Anthony Chung

Dieter Kraus

Stefan Wiesner

Almut Czap

Wolfgang Singer

Udo Dinger

Stefan Hembacher

Timo Laufer

Johannes Zellner

Yim-Bun-Patrick Kwan

Frank Eisert

Martin Lowisch

Andreas Ochse

In order to clean optical components () inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, () arranged to apply an electric and/or magnetic field, downstream of the heating filament () in the direction of flow of the hydrogen (). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam ().

Cleaning module, EUV lithography device and method for the cleaning thereof

An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device () for processing an optical element (), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (), the processing device () includes a particle generator () for generating a particle beam, in particular an electron beam (), and/or a high-frequency generator.

EUV lithography device and method for processing an optical element

A projection objectivefor short wavelengths, in particular for wavelengths &#x3bb;&#x3c;157 nm is provided with a number of mirrors [MMMMMand Mthat are arranged positioned precisely in relation to an optical axisThe mirrors [MMMMMand Mhave multilayer coatings. At least two different mirror materials are provided which differ in the rise in the coefficient of thermal expansion as a function of temperature in the region of the zero crossing of the coefficients of thermal expansion, in particular in the sign of the size.

Projection objective

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Rainau, Germany

Stefan Koehler