Siddhartha Panda

This inventor holds 30 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: International Business Machines Corporation, Chartered Semiconductor Manufacturing Ltd (Corporation), Tokyo Electron Limited. Active years: 2004-2014.

USPTO Granted Patents = 30 (Patent Applications = 1)

% Patents Active = 16.7

EPO Patents = 1

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 458(Granted Patents)

Location History:

I.I.T. Kanpur, IN (2011)
Beacon, NY (US) (2004 - 2013)
Kanpur, IN (2008 - 2014)

Company Filing History:

27 out of 166,159

International Business Machines Corporation

patents

3 out of 962

Chartered Semiconductor Manufacturing Ltd (Corporation)

patents

3 out of 10,837

Tokyo Electron Limited

patents

4. 1 out of 41

Indian Institute of Technology Kanpur

patents

5. 1 out of 244

Infineon Technologies North America Corp.

patents

6. 1 out of 53,211

Kabushiki Kaisha Toshiba

patents

7. 1 out of 132,107

Samsung Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2004-2014

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30 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8783948 - Flexible temperature sensor and sensor array (2014-07-22),

2. 8492803 - Field effect device with reduced thickness gate (2013-07-23),

3. 8048325 - Method and apparatus for multilayer photoresist dry development (2011-11-01),

4. 7977185 - Method and apparatus for post silicide spacer removal (2011-07-12),

5. 7863197 - Method of forming a cross-section hourglass shaped channel region for charge carrier mobility modification (2011-01-04),

6. 7776695 - Semiconductor device structure having low and high performance devices of same conductive type on same substrate (2010-08-17),

7. 7754615 - Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current (2010-07-13),

8. 7709317 - Method to increase strain enhancement with spacerless FET and dual liner process (2010-05-04),

9. 7687829 - Stressed field effect transistors on hybrid orientation substrate (2010-03-30),

10. 7645656 - Structure and method for making strained channel field effect transistor using sacrificial spacer (2010-01-12),

11. 7645356 - Method of processing wafers with resonant heating (2010-01-12),

12. 7525161 - Strained MOS devices using source/drain epitaxy (2009-04-28),

13. 7459382 - Field effect device with reduced thickness gate (2008-12-02),

14. 7442618 - Method to engineer etch profiles in Si substrate for advanced semiconductor devices (2008-10-28),

15. 7438822 - Apparatus and method for shielding a wafer from charged particles during plasma etching (2008-10-21),

Title: Siddhartha Panda: Pioneering Inventor from Beacon, NY

Introduction: Siddhartha Panda is a renowned inventor hailing from Beacon, NY, known for his groundbreaking innovations in various fields.

Latest Patents: Siddhartha Panda holds several patents in the areas of renewable energy technologies, sustainable agriculture, and advanced healthcare devices.

Career Highlights: With a career spanning over two decades, Siddhartha Panda has worked with leading research institutions and companies to develop cutting-edge solutions that have had a significant impact on society.

Collaborations: Throughout his career, Siddhartha Panda has collaborated with top universities, research institutions, and multinational corporations to bring his inventions to life and make a difference in the world.

Conclusion: Siddhartha Panda's passion for innovation and his dedication to creating a better future through his inventions make him a true visionary in the field of technology and beyond.