Location History:
- Yamanashi-ken, JP (1996 - 2004)
- Tokyo, JP (1994 - 2013)
- Minato-ku, JP (2016)
- Nirasaki, JP (2002 - 2017)
- Yamanashi, JP (1995 - 2023)
Company Filing History:
20 out of 10,341 
5 out of 442 
1 out of 29 
Years Active: 1994-2023
Title: Shuji Moriya: Innovator in Substrate Processing Technology
Introduction
Shuji Moriya, an accomplished inventor based in Nirasaki, Japan, holds an impressive portfolio of 26 patents. His work chiefly focuses on advancing technology related to substrate processing and cleaning apparatuses, addressing critical needs in the semiconductor and materials industries.
Latest Patents
Moriya’s latest innovations include a **Substrate Cleaning Apparatus**, which effectively cleans a processing target substrate by blasting gas clusters onto it. The design features a chamber to accommodate the substrate, a rotary stage to support the substrate’s rotation, and a blasting unit that directs gas clusters towards the substrate. A driving unit scans the gas cluster-blasted area to enhance cleaning efficiency, while an exhaust port evacuates the chamber. This apparatus incorporates a control mechanism to manage the scattering direction of the particles and minimize their re-adhesion to the substrate.
Another notable patent is the **Method for Cleaning Chamber of Substrate Processing Apparatus**. This innovative cleaning technique employs a prescribed reflecting member within the chamber, using gas clusters to clean the walls of the chamber by removing adhered particles. This method not only optimizes the cleaning process but also maintains the integrity of the substrate processing environment.
Career Highlights
Moriya has significantly contributed to the field while working with renowned companies such as Tokyo Electron Limited and Fujikin Inc. His efforts in these esteemed organizations underscore his commitment to enhancing substrate processing technologies and developing solutions that meet industry demands.
Collaborations
Throughout his career, Shuji Moriya has collaborated with fellow inventors such as Tsuneyuki Okabe and Tsutomu Shinohara. Their combined expertise has led to advancements in substrate cleaning methodologies and equipment, pushing the boundaries of what is achievable in the field.
Conclusion
Shuji Moriya's contributions to the realm of substrate processing technology are immense, as evidenced by his numerous patents and innovative designs. His work not only improves cleaning methods but also sets a standard for future developments in this critical tech sector. As new technologies emerge, Moriya's innovations will undoubtedly play a key role in shaping advancements in the industry.