The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Oct. 20, 2016
Tokyo Electron Limited, Tokyo, JP;
Yukimasa Saito, Yamanashi, JP;
Toshiki Hinata, Yamanashi, JP;
Kazuya Dobashi, Yamanashi, JP;
Kyoko Ikeda, Yamanashi, JP;
Shuji Moriya, Yamanashi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
According to the present invention, a substrate processing apparatus has a chamber (), a stage () for holding a substrate (W) to be processed in the chamber (), and a nozzle part () from which a gas cluster is blasted onto the substrate (W) to be processed, and has a function for processing the substrate (W) to be processed by the gas cluster. Cleaning of the inside of the chamber () is performed by: placing a prescribed reflecting member (dW,) in the chamber (), blasting a gas cluster (C) onto the reflecting member (dW,), and applying the gas-cluster flow reflected by the reflecting member (dW,) onto a wall section of the chamber () to remove particles (P) adhered to the wall section of the chamber ().