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For the Inventor, By the Inventor

Yamanashi, Japan

Kazuya Dobashi

This inventor holds 26 USPTO granted patents and 7 published patent applications, primarily in Substrate Cleaning Technology. Top assignees: Tokyo Electron Limited, Iwatani Corporation, Tel Manufacturing and Engineering of America, Inc.. Active years: 2008-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuya Dobashi. Retrieved from https://idiyas.com/inventor/kazuya-dobashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 76.9

Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 46(Granted Patents)


Location History:

  • Nirasaki, JP (2008 - 2022)
  • Tokyo, JP (2022)
  • Yamanashi, JP (2013 - 2023)
  • Hillsboro, OR (US) (2022 - 2024)

Company Filing History:

goldMedal24 out of 10,904 
 
Tokyo Electron Limited
 patents
silverMedal4 out of 33 
 
Iwatani Corporation
 patents
bronzeMedal2 out of 21 
 
Tel Manufacturing and Engineering of America, Inc.
 patents
4. 1 out of 870 
 
Kyoto University
 patents
where one patent can have more than one assignee

Years Active: 2008-2024

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Areas of Expertise:
Gas Cluster Processing
Substrate Cleaning
Semiconductor Manufacturing
Cleaning Method
Processing Apparatus
Vacuum Processing
Plasma Generation
Pattern Enhancement
Metal Contamination
Analysis Method
Processing System
Storage Medium
26 patents (USPTO):Explore Patents
1. 12172198 - Gas cluster processing device and gas cluster processing method (2024-12-24),
2. 11865590 - Substrate cleaning method, processing container cleaning method, and substrate processing device (2024-01-09),
3. 11772138 - Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method (2023-10-03),
4. 11761075 - Substrate cleaning apparatus (2023-09-19),
5. 11694872 - Pattern enhancement using a gas cluster ion beam (2023-07-04),
6. 11517943 - Cleaning method and substrate processing apparatus (2022-12-06),
7. 11504751 - Substrate cleaning method, processing container cleaning method, and substrate processing device (2022-11-22),
8. 11450506 - Pattern enhancement using a gas cluster ion beam (2022-09-20),
9. 11446714 - Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method (2022-09-20),
10. 11267021 - Gas cluster processing device and gas cluster processing method (2022-03-08),
11. 10786837 - Method for cleaning chamber of substrate processing apparatus (2020-09-29),
12. 10381233 - Method and apparatus for substrate processing (2019-08-13),
13. 10163622 - Substrate cleaning method, substrate processing method, substrate processing system and semiconductor device manufacturing method (2018-12-25),
14. 10049899 - Substrate cleaning apparatus (2018-08-14),
15. 9960056 - Substrate cleaning method, substrate cleaning apparatus and vacuum processing system (2018-05-01),

Title: Kazuya Dobashi: Innovator in Gas Cluster Processing Technology

Introduction

Kazuya Dobashi, hailing from Yamanashi, Japan, is an esteemed inventor known for his significant contributions to the field of gas cluster processing. With an impressive portfolio of 26 patents to his name, he has been at the forefront of technological innovations that enhance processing techniques for various substrates.

Latest Patents

Among his latest inventions are pivotal patents including a gas cluster processing device and a gas cluster processing method. The gas cluster processing device is designed to perform specific processes on a workpiece by irradiating it with a gas cluster. The innovative device incorporates several key features: a processing container for the workpiece, a gas supply part to generate the gas cluster, a flow rate controller to manage the gas supply, and a cluster nozzle for converting the gas into a gas cluster through adiabatic expansion while maintaining a vacuum state. Additionally, the gas cluster processing method outlines a substrate cleaning technique that utilizes vertical shock waves generated by spraying gas from a nozzle, effectively removing contaminants from the substrate's surface.

Career Highlights

Kazuya Dobashi has made his mark by working with prominent companies such as Tokyo Electron Limited and Iwatani Corporation. His tenure in these organizations has allowed him to advance his research and development in the highly specialized area of gas cluster technology.

Collaborations

Throughout his career, Kazuya has collaborated with notable professionals in the field, including Kensuke Inai and Kyoko Ikeda. These collaborations have played a crucial role in refining his innovations and contributing to the successful development of his patented technologies.

Conclusion

As a distinguished inventor, Kazuya Dobashi continues to push the boundaries of innovation in the realm of gas cluster processing. His extensive patent portfolio reflects a deep commitment to advancing technology that promises to enhance manufacturing processes and improve the efficiency of substrate treatment methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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