The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Oct. 20, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kyoko Ikeda, Yamanashi, JP;

Kazuya Dobashi, Hillsboro, OR (US);

Tsunenaga Nakashima, Kumamoto, JP;

Kenji Sekiguchi, Yamanashi, JP;

Shuuichi Nishikido, Kumamoto, JP;

Masato Nakajo, Kumamoto, JP;

Takahiro Yasutake, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
B08B 5/02 (2013.01); H01L 21/02041 (2013.01);
Abstract

A substrate cleaning method includes: arranging a substrate within a processing container; spraying gas from a spray port of a gas nozzle arranged within the processing container; causing vertical shock waves, generated by spraying the gas from the gas nozzle, to collide with a main surface of the substrate; and removing particles adhering to the main surface of the substrate, by causing the vertical shock waves to collide with the main surface of the substrate.


Find Patent Forward Citations

Ikeda, Kyoko. (2024). Substrate cleaning method, processing container cleaning method, and substrate processing device (U.S. Patent No. 11865590). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11865590

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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