IDiyas

For the Inventor, By the Inventor

Kofu, Japan

Kyoko Ikeda

USPTO Granted Patents = 16

Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 34(Granted Patents)


Location History:

  • Kofu, JP (2003 - 2012)
  • Nirasaki, JP (2016 - 2022)
  • Yamanashi, JP (2020 - 2024)

Company Filing History:

goldMedal15 out of 10,295 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 101 
 
Tokyo Electron Limi Ted
 patents

Years Active: 2003-2024

Loading Chart...
16 patents (USPTO):
1. 11865590 - Substrate cleaning method, processing container cleaning method, and substrate processing device (2024-01-09),
2. 11761075 - Substrate cleaning apparatus (2023-09-19),
3. 11517943 - Cleaning method and substrate processing apparatus (2022-12-06),
4. 11504751 - Substrate cleaning method, processing container cleaning method, and substrate processing device (2022-11-22),
5. 11281116 - Substrate stage and substrate processing apparatus (2022-03-22),
6. 10870916 - Gas supply member and gas processing apparatus (2020-12-22),
7. 10786837 - Method for cleaning chamber of substrate processing apparatus (2020-09-29),
8. 9939200 - Substrate transfer system and heat treatment apparatus using same (2018-04-10),
9. 9343295 - Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium (2016-05-17),
10. 8100147 - Particle-measuring system and particle-measuring method (2012-01-24),
11. 7931945 - Film forming method (2011-04-26),
12. 7894059 - Film formation processing apparatus and method for determining an end-point of a cleaning process (2011-02-22),
13. 7667840 - Particle-measuring system and particle-measuring method (2010-02-23),
14. 7515264 - Particle-measuring system and particle-measuring method (2009-04-07),
15. 7511814 - Particle-measuring system and particle-measuring method (2009-03-31),

Title: Kyoko Ikeda: Innovator in Substrate Cleaning Technologies

Introduction

Kyoko Ikeda is a prominent inventor based in Kofu, Japan, known for her significant contributions to substrate cleaning technologies. With a total of 16 patents to her name, she has developed innovative methods and apparatuses that enhance the efficiency of substrate processing.

Latest Patents

Among her latest patents are a substrate cleaning method and a substrate cleaning apparatus. The substrate cleaning method involves arranging a substrate within a processing container and spraying gas from a nozzle. This process generates vertical shock waves that collide with the substrate's main surface, effectively removing adhering particles. The substrate cleaning apparatus is designed to clean a processing target substrate by blasting gas clusters. It includes a chamber for the substrate, a rotary stage for support, and a control mechanism to manage particle scattering and prevent re-adhesion.

Career Highlights

Kyoko Ikeda has worked with notable companies, including Tokyo Electron Limited, where she has honed her skills in developing advanced cleaning technologies. Her work has significantly impacted the semiconductor industry, where cleanliness is paramount for device performance.

Collaborations

Throughout her career, she has collaborated with talented individuals such as Hayashi Otsuki and Tsukasa Matsuda, contributing to the advancement of substrate cleaning methods.

Conclusion

Kyoko Ikeda's innovative work in substrate cleaning technologies showcases her expertise and dedication to improving processing methods. Her patents reflect her commitment to enhancing efficiency in the semiconductor industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…