The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Oct. 31, 2007
Hayashi Otsuki, Nakakoma-gun, JP;
Tsukasa Matsuda, Kitakoma-gun, JP;
Kyoko Ikeda, Kofu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention provides a particle measuring system which is provided in a processing systemwhich generates an atmosphere obtained by exhausting air or a gas in a processing chamberby a vacuum pumpand applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipewhich connects an exhaust openingof the processing chamberwith the vacuum pump, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.