Nakakoma-gun, Japan

Hayashi Otsuki

This inventor holds 23 USPTO granted patents and 1 published patent application, primarily in Semiconductor Processing. Top assignees: Tokyo Electron Limited, Toyo Tanso Co., Ltd.. Active years: 2001-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hayashi Otsuki. Retrieved from https://idiyas.com/inventor/hayashi-otsuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 21.7

Average Co-Inventor Count = 2.0

ph-index = 7

Forward Citations = 342(Granted Patents)


Location History:

  • Tokyo-To, JP (2004)
  • Kousai-machi, JP (2005 - 2006)
  • Nirasaki, JP (2004 - 2011)
  • Naka-koma-gun, JP (2001 - 2012)

Company Filing History:


Years Active: 2001-2012

Loading Chart...
Areas of Expertise:
Particle-Measuring System
Film Forming Method
Gas Processing Apparatus
Semiconductor Device
Chemical Vapor Deposition
TiSiN Film
Electrode Formation
SiC Material
Diffusion Barrier
Wiring Structure
High-Corrosion-Resistant Film
Integrated Valve Unit
23 patents (USPTO):Explore Patents

Title: **Hayashi Otsuki: A Pioneer in Particle Measuring Systems**

Introduction

Hayashi Otsuki, a prominent inventor based in Nakakoma-gun, Japan, has made significant contributions to the field of semiconductor manufacturing. With a total of 23 patents to his name, Otsuki's innovations primarily focus on advanced particle measuring systems and methods that enhance processing efficiency and cleanliness in high-tech environments.

Latest Patents

Otsuki's latest patents include a **Particle-Measuring System and Particle-Measuring Method**. This invention provides a breakdown of a system that generates an atmosphere in a processing chamber by exhausting air or gas using a vacuum pump. It applies processes related to semiconductor manufacture on a wafer and measures the number of particles present in the exhaust gas. The invention also outlines a cleaning method that effectively determines the endpoint of the etching process based on particle counts, ensuring a more efficient termination of unnecessary films. Furthermore, he has developed a **Film Forming Method**, which shares similarities with his particle-measuring advancements, underscoring his commitment to refining semiconductor fabrication processes.

Career Highlights

Throughout his career, Otsuki has worked with renowned companies such as Tokyo Electron Limited and Toyo Tanso Co., Ltd. His experience in these organizations has provided him with valuable insights into the semiconductor industry, driving his innovations that cater to modern manufacturing challenges.

Collaborations

Otsuki has collaborated with notable individuals such as Tsukasa Matsuda and Kyoko Ikeda. Their teamwork has contributed to the successful development of various technologies that improve the efficiency and reliability of semiconductor processing.

Conclusion

Hayashi Otsuki's contributions to the field of semiconductor manufacturing through his innovative patents have cemented his status as a key figure in the industry. His dedication to improving particle measuring systems and methods continues to pave the way for advancements in clean manufacturing processes, significantly impacting semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…